High optical efficiency GaN based blue LED on silicon substrate

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  • AcceptedMar 11, 2015
  • PublishedMay 5, 2015
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Abstract

经过近十年的探索, 作者在国际上率先突破了硅衬底高光效GaN基蓝光LED材料生长技术及其薄膜型芯片制造技术, 制备了内量子效率和取光效率均高达80%的单面出光垂直结构GaN基蓝光LED, 并实现了产业化和商品化, 成功地应用于路灯、球炮灯、矿灯、筒灯、手电和显示显像等领域. 本文就相关关键技术进行全面系统地介绍. 发明了选区生长、无掩模微侧向外延等技术, 仅用100 nm厚的单一高温AlN作缓冲层, 制备了无裂纹、厚度大于3 μm的器件级GaN基LED薄膜材料, 位错密度为5×108 cm-2. 发明了自成体系的适合硅衬底GaN基薄膜型LED芯片制造的工艺技术, 包括高反射率低接触电阻p型欧姆接触电极、高稳定性低接触电阻n型欧姆接触电极、表面粗化、互补电极、GaN薄膜应力释放等技术, 获得了高光效、高可靠性的硅基LED, 蓝光LED(450 nm)在350 mA(35 A/cm2)下, 光输出功率达657 mW, 外量子效率为68.1%.


Funded by

国家科技支撑计划(2011BAE32B01)

国家自然科学基金(61334001)

电子发展基金

国家高技术研究发展计划(2011AA03A101)


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